| 摘要 |
PURPOSE: A method for manufacturing thin film actuated mirror arrays is provided to improve a horizontal degree of a mirror by forming the mirror on the second sacrifice having a flat surface. CONSTITUTION: An active matrix(100) is prepared which includes the first metal layer having a drain pad that is extended from a drain of a MOS transistor. The first sacrifice layer(180) is formed on an entire surface of the active matrix. After patterning the first sacrifice layer, an actuator having a support layer, a bottom electrode, an active layer, and a top electrode is formed on the first patterned sacrifice layer. A back side metal layer is formed on a back surface of the active matrix, and the second sacrifice layer is formed on the actuator. A part of the top electrode(180) is exposed by patterning the second sacrifice layer. A post(220) and a mirror(230) are formed on the exposed top electrode and the second sacrifice layer, which are simultaneously removed using BrF3 or XeF2.
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