APPARATUS FOR PREVENTING THERMAL DEFORMATION OF X-RAY MASK FOR EXPOSURE PROCESS IN SEMICONDUCTOR MANUFACTURING

摘要

PURPOSE: An apparatus for preventing thermal deformation of an X-ray mask for an exposure process in semiconductor manufacturing is provided to be capable of enhancing the yield in the exposure process by preventing the thermal deformation of a membrane due to X-ray irradiation to remove pattern failure. CONSTITUTION: An X-ray absorber(22) is covered over a membrane(21) and a tube type cooling cap(3) having cooling liquid inlet/outlet ports which cooling liquid flows through is also mounted over the membrane(21). A cooling liquid circulating line(4) is connected to the inlet/outlet ports of the cooling cap(3). A flow rate regulating valve(5) for regulating the flow rate of cooling liquid is mounted on one side of the cooling liquid circulating line(4), and a temperature converter(6) for cooling the liquid discharged through the outlet port of the cooling cap by heat exchange. A controller(7) controlling the temperature converter(6) to adjust the temperature of the cooling liquid is connected to the temperature converter(6).