| 摘要 |
PURPOSE: An overlay measurement target and a method for manufacturing the same are provided to be capable of increasing yield by minimizing beam shot region. CONSTITUTION: The overlay measurement target comprises an inner box(15), an outer box(13) formed in outside of the inner box(15), and DC-bar patterns(31) which are vertically and horizontally formed in four corners of the outer box(13). In manufacturing the overlay measurement target, the inner box is first formed by exposing and developing photoresist coated on a substrate. Then, any film is formed on the substrate including the inner box, photoresist is coated on the film to be exposed and developed, thereby forming the outer box having area greater than that of the inner box. Finally, the CD-bar patterns are formed.
|
