Charged particle beam exposure apparatus for integrated circuit manufacture shortens settling time to point at which beam has bean deflected to defined position

摘要

An electron source produces the charged particle beam. A converging lens converges the beam onto a sample. A deflector deflects the beam. A movement mechanism displaces the sample mounted on it. A control unit controls various components of the apparatus. A device shortens the settling time from a point at which deflection position data are supplied to the deflector until the point at which the charged particle beam has been deflected to the defined deflection position. An Independent claim is included for an exposure method.