METHOD OF MANUFACTURING X-RAY MASKS

摘要

PURPOSE: A method of manufacturing X-ray masks is provided to be capable of enhancing the characteristics of the mask by forming an X-ray mask which a membrane and a frame are integrated into to remove the stress due to the gap difference between grids in forming a frame. CONSTITUTION: A membrane layer(32a) is formed on a substrate. Then, the substrate is removed and then a frame(34) of the same property as the membrane layer(32a) is formed on edge portions of the membrane layer. Next, absorber is formed on a portion of the membrane opposite to the frame. Preferably, the membrane layer may be formed of diamond layer having a thickness of 0.5-2 micrometer by a hetero-epitaxial method or may be formed of carbon silicon layer having a thickness of 0.-5 micrometer.