| 摘要 |
PROBLEM TO BE SOLVED: To provide a satin which is not easily soiled and can be easily cleaned even if the satin is soiled and further has a high scratch resistance and provide a mold which can form a satin simultaneous with molding. SOLUTION: In a satin comprising fine recesses and projections, the projections 1 are independently formed on a reference plane L. A photosensitive acid-resistant film 5 is formed over the satin and plane, following which a satin pattern 6 is applied onto the upper surface of the film 5 using a light screen, and the film 5 of the pattern 6 is washed off by a sensitizing treatment and development. Thereafter, an acid liquid is sprayed on the surface of the film 5 to etch the pattern 6, thereby forming independent recesses.
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