| 摘要 |
PROBLEM TO BE SOLVED: To uniformly bring the surface of an anode plate with an etching soln. while the etching soln, is stirred, to uniformize the reaction rate and to increase the applying voltage to a space between the electrode plates while the generation of gaseous chlorine is suppressed. SOLUTION: The center, in the width direction of an electrolytic cell 1 to form a hollow rectangular parallelpiped whose upper part is opened is deposited with an ion exchange membrane 4 via a frame body 5, the inside of the electrolytic cell 1 is divided into an anode chamber 2 and a cathode chamber 3, the inside of the anode chamber 2 is deposited with an anode plate 6, moreover, the inside of the cathode chamber 3 is deposited with a cathode plate 8, furthermore, the inside of the cathode chamber 3 is filled with a cathode soln., and into the anode chamber 2, an etching soln. is flowed from a feed path 22 at the lower end thereof, and, while being brought into contact with the anode plate 6, the etching solution is flowed toward the upper direction, is uniformly overflowed from the upper end part of the frame body 5 and is uniformly flowed out into a receiving trough 24.
|
