发明名称 PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a processor in which an unnecessary film is difficult to deposit, but difficult to be peeled, the cleaning interval can be prolonged, and generation of particles can be suppressed by applying a special treatment to a surface of a metal member including a processing container. SOLUTION: In a processor 14 to process a work W in a specified manner by placing the work W on a placement base 22 in an evacuative processing container 16, and feeding a processing gas from a shower head part 74 provided on a ceiling part of the processing container 16, organic mechanical-chemical polishing, blasting and anodizing are successively executed on the surfaces of aluminum members 16, 74 used for the processor. An unnecessary film is difficult to deposit, but difficult to be peeled, and the cleaning interval can be prolonged thereby.
申请公布号 JP2000303180(A) 申请公布日期 2000.10.31
申请号 JP19990110147 申请日期 1999.04.16
申请人 HITACHI LTD;TOKYO ELECTRON LTD 发明人 KAJIYAMA MORIO;NAKATSUKA SAKAE;AEBA YASUSHI
分类号 B05B1/14;C23C16/44;H01L21/285;H01L21/30;(IPC1-7):C23C16/44 主分类号 B05B1/14
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