发明名称 Wafer separating and cleaning apparatus and process
摘要 An individual wafer separating part separates batched wafers one by one from a slice base mounting beam, and then a shuttle conveyor transports the separated wafers one by one to an individual cleaning part so that the wafers can be cleaned individually. After the cleaning, a detecting part detects the thickness, breaking, chipping and remaining adhesives of the wafers. The wafers are classified in accordance with the results of the detection. Normal wafers are collected in wafer collecting parts, failed wafers are collected in a failed wafer collecting part, and wafers with remaining adhesives are collected into an adhesive remaining wafer collecting part.
申请公布号 US6139591(A) 申请公布日期 2000.10.31
申请号 US19990244049 申请日期 1999.02.04
申请人 TOKYO SEIMITSU CO., LTD. 发明人 NAKAURA, KENICHI;MINAMI, SATORU;MIYANARI, DAIZO
分类号 B28D5/00;H01L21/00;H01L21/677;(IPC1-7):H01L21/00;H01L21/64;H01L21/46;H01L21/78;H01L21/301 主分类号 B28D5/00
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