PHOTORESIST MONOMER AND ITS PRODUCTION, PHOTORESIST COPOLYMER AND ITS PRODUCTION, PHOTORESIST COMPOSITION, FORMATION OF PHOTORESIST PATTERN AND SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To obtain a new compound of a polyalicyclic derivative containing oxygen or sulfur in the cyclic compound, and having hydroxy group, excellent in etching resistance and useful for a photoresist. SOLUTION: This new compound is a photoresist monomer compound of formula I [X and Y are each O, S, CH2 or the like; (n) is 0-5; A and R1 to R4 are each H, a 1-10C substituted alkyl or the like, with the proviso that one or more thereof are each COOR'-OH (R' is a substituted alkyl)], e.g. 2- hydroxyethyl-7-thiabicyclo[2,2,1]hept-5-ene-2-carboxylate. The compound of formula I is obtained by subjecting a compound of formula II (e.g. thiopene) and a compound of formula III (e.g. 2-hydroxyethyl acrylate) to a Diels-Alder reaction, and further subjecting the product and a compound of formula IV (e.g. furan) to the Diels-Alder reaction.