发明名称 METHOD FOR CLEANING PRINTING MASK AND APPARATUS FOR CLEANING PRINTING MASK
摘要 PROBLEM TO BE SOLVED: To lessen the occurrence of peeling of laminated portions in a framed printing mask and the peeling of coating layers of the printing mask by outputting non-square waves having a high-frequency component lower than square waves as ultrasonic waves. SOLUTION: The square waves outputted from an oscillation circuit 3 are made gentler in the inclination of their rising parts and falling parts and are made into the non-square waves by integration processing of an integrated circuit 4 composed of, for example, resistors and a capacitors. The non-square waves are amplified in an amplifier circuit 5 and are then outputted to any of vibrators 7a, 7b, 7c and 7d respectively varying in resonance frequencies via a switching circuit 6 after amplifying the non-square waves by the amplifier circuit 5 According to such constitution, the removal of the adhesives in the laminated parts of the framed printing mask 12 is made harder and the peeling of the coating layers from the plastic mask material of the printing mask 12 may be made harder than a case the supersonic wave vibration of the square waves is generated and, therefore, the occurrence of the peeling of the laminated part and the peeling of the coating layers may be lessened.
申请公布号 JP2000301088(A) 申请公布日期 2000.10.31
申请号 JP19990114183 申请日期 1999.04.21
申请人 RICOH MICROELECTRONICS CO LTD 发明人 KINOSHITA SHINGEN
分类号 B08B3/12;B41F35/00;B41N3/06;(IPC1-7):B08B3/12 主分类号 B08B3/12
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