发明名称 PRODUCTION OF THIN FILM
摘要 PROBLEM TO BE SOLVED: To prevent the generation of a part of a film and the powder of unreactants to be generated in the process of the production of a multilayer film by suppressing the drop of the pressure in a reaction chamber for a period till the film formation of the following layer is started directly after the turning- off of an RF power source upon the completion of the film formation of a certain layer. SOLUTION: In the case film formation is executed as to an A layer and a B layer, the film formation is executed with gaseous materials 11 and 12 as for the A layer, and with gaseous materials 12 and 13 as for the B layer. When the vacuum in a reaction chamber 1 remarkably deviates in the case the film formation turns from the A layer to the B layer, a part of the film peeled from the inner wall of a vacuum vessel, electrodes, or the like, and the powder of unreactants are dropped away and deposited on the substrate. As a countermeasure therefor, the remarkable deviation of the vacuum in the reaction chamber 1 is prevented. Concretely, after the completion of the film formation in the A layer, stop valves 31-32 and 51-52 for the A layer are closed, and simultaneously, stop valves 32-33 and 52-53 for the B layer are opened.
申请公布号 JP2000303184(A) 申请公布日期 2000.10.31
申请号 JP19990111801 申请日期 1999.04.20
申请人 STANLEY ELECTRIC CO LTD 发明人 OKADA SATOSHI;SAKAMOTO NORIHIRO;HAMANAKA HIROAKI;SUDA FUMIYUKI
分类号 G03G5/08;C23C16/52;(IPC1-7):C23C16/52 主分类号 G03G5/08
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