DEVICE AND METHOD FOR TREATING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To sufficiently remove an org. material from a substrate by ozonic water by heating the ozonic water supplied to the substrate by a supply means by a heating means. SOLUTION: An ozonic water heating part 6 is provided at an ozonic water supply pipe L3. The ozonic water at about 20-25 deg.C for example is heated by 3-60 deg.C to about 23-85 deg.C by the heating part 6. The decomposition of the ozone is rapidly advanced in the ozonic water heated by the ozonic water heating part 6, as the result, an active oxygen concn. in the ozonic water is increased. The oxidation capacity of the ozonic water is increased since the active oxygen is higher in oxidation capacity than ozone. The org. material such as resist stuck to the substrate W is sufficiently removed by this oxidation capacity since the oxidation capacity of the ozonic water OL stored in a washing tank 2 is increased by supplying the ozonic water increased in oxidation capacity to the washing tank 2.