| 摘要 |
PROBLEM TO BE SOLVED: To provide a preparation method of a shadow mask while easily adjusting a proper etching liquid and prolonging a service life of the etching liquid to reduce the waste. SOLUTION: The shadow mask is prepared by spraying an etching liquid containing ferric chloride as a principal component to the surface of a thin metallic plate 20 where resists 23a, 23b having patterns corresponding to openings 24 of the shadow mask are formed to form the openings on the shadow mask by etching and recovering the sprayed etching liquid to be reused. In this case, the concentration of the etching liquid when it is stored or transported is made lower than that of the etching liquid when it is used for etching and a relatively higher concentration etching liquid is fittingly added to the etching liquid to be used for etching. The relatively higher concentration etching liquid is prepared by adding iron and chlorine to the relatively lower concentration etching liquid to chemically react with each other.
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