发明名称 EVACUATING TYPE VAPOR GROWTH DEVICE WITH GAS DISPERSING MECHANISM
摘要 PROBLEM TO BE SOLVED: To break the vacuum state in a reaction chamber in a short time without causing film peeling or diffusion of products or the like in the reaction chamber by dispersedly reducing the kinetic energy of an inert gas injected from an injector and introducing a large flow rate of the inert gas into the reaction chamber. SOLUTION: The gas discharging side of an injector 3 is set to the inside of a reaction chamber 5, and plural gas discharging ports 3a are opened at the tube walls thereof. The opening positions of the plural gas discharging ports 3a are made different so as to prevent their overlapping. Moreover, the aperture and shape of the gas discharging ports 3a in the injector 3 are changed, and the conductance is changed to control the amt. of the gas to be discharged from each gas discharging port 3a. Inert gas is introduced into the reaction chamber 5 as being branched from each gas discharging port 3a while it reaches from the base part of the injector 3 to the gas discharging side, and the kinetic energy of the gas is reduced. Thus, a large flow rate of gas can be introduced without causing peeling and whirling.
申请公布号 JP2000303176(A) 申请公布日期 2000.10.31
申请号 JP19990111137 申请日期 1999.04.19
申请人 NEC KYUSHU LTD 发明人 YAMAZAKI KEN
分类号 H01L21/205;C23C16/44;C23C16/455;F16K51/02;(IPC1-7):C23C16/44 主分类号 H01L21/205
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