| 发明名称 |
Photoresist compositions |
| 摘要 |
Disclosed is a composition comprising a blend of (a) a thermally reactive polymer selected from the group consisting of resoles, novolacs, thermally reactive polyarylene ethers, and mixtures thereof; and (b) a photoreactive epoxy resin that is photoreactive in the absence of a photocationic initiator.
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| 申请公布号 |
US6139920(A) |
申请公布日期 |
2000.10.31 |
| 申请号 |
US19980217330 |
申请日期 |
1998.12.21 |
| 申请人 |
XEROX CORPORATION |
发明人 |
SMITH, THOMAS W.;LUCA, DAVID J.;MCGRANE, KATHLEEN M. |
| 分类号 |
C08L63/00;G03F7/038;(IPC1-7):G03F7/038;C08L63/10;C08L63/04;C08L71/12 |
主分类号 |
C08L63/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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