发明名称 Electrode for optical waveguide element and method of forming the same
摘要 A metal film consisting of a first metal layer of at least one of Ta, Cr, W and Mo, a second metal layer of at least one of Au, Pt and Ag and a third metal layer of at least one of Ta, Cr, W and Mo superposed one on another in this order is formed on a surface of a substrate. Openings of predetermined shapes are formed in the metal film, and proton exchange is carried out on the surface of the substrate with the metal film used as a mask, thereby forming optical channel waveguides. Then the third metal layer is removed from the metal film, and the metal film consisting of the first and second metal layers into electrodes for applying an electric voltage to the optical channel waveguides.
申请公布号 US6141478(A) 申请公布日期 2000.10.31
申请号 US20000518227 申请日期 2000.03.02
申请人 FUJI PHOTO FILM CO., LTD. 发明人 TSURUMA, ISAO
分类号 G02F1/313;G02F1/03;G02F1/035;H01S5/042;(IPC1-7):G02B6/10 主分类号 G02F1/313
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