发明名称 |
Method relating to the manufacture of a semiconductor component |
摘要 |
A manufacturing method for semiconductor components is disclosed which will allow better precision in the definition of the doped areas of the components and the separation of differently doped areas. A selectively shaped area of, for example, polysilicon, defining the area or areas to be doped, is deposited on the component before masks are applied. This makes the positioning of masks less critical because they only have to be positioned within the area of the polysilicon layer. In this way, an accuracy of 0.1 mu m or better can be achieved.
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申请公布号 |
US6140194(A) |
申请公布日期 |
2000.10.31 |
申请号 |
US19980033714 |
申请日期 |
1998.03.03 |
申请人 |
TELEFONAKTIEBOLAGET LM ERICSSON (PUBL) |
发明人 |
SJOEDIN, HAAKAN;SOEDERBAERG, ANDERS;OEGREN, NILS;HAMBERG, IVAR;OLOFSSON, DIMITRI;ANDERSSON, KARIN |
分类号 |
H01L29/73;H01L21/033;H01L21/266;H01L21/331;H01L21/8222;(IPC1-7):H01L21/331 |
主分类号 |
H01L29/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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