发明名称 ELECTROLESS PLATING METHOD, ELECTRODE STRUCTURAL BODY AND CONDUCTIVE PASTE USED THEREFOR
摘要 PROBLEM TO BE SOLVED: To securely and efficiently execute plating on desired electrodes by forming electrodes contg. a metallic component to be formed into a catalyst and applying electroless plating on the electrodes. SOLUTION: Ag powder as conductive component, Pd powder to be formed into a catalyst, an organic solvent and a resin are blended and kneaded to prepare conductive paste 1. This conductive paste 1 is applied to a prescribed position on a substrate 2 so as to form into a prescribed electrode pattern. The conductive paste 1 is heat-treated and baked to form plural thick film electrodes 3. If required, the surfaces of the thick film electrodes 3 are degreased or subjected to etching for improving their adhesion with plating films. Then, the substrate 2 is dipped into an electroless plating bath contg. Ni as plating metal to form Ni plating films 4 on he surfaces of the thick film electrodes 3. Moreover, this substrate 2 is dipped into an electroless plating bath contg. Au as plating metal, and Au plating films 5 are formed on the Ni plating films 4 formed on the surfaces of the thick film electrodes 3.
申请公布号 JP2000303186(A) 申请公布日期 2000.10.31
申请号 JP19990108942 申请日期 1999.04.16
申请人 MURATA MFG CO LTD 发明人 KODO GIICHI;KAWAKAMI KENJI;ADACHI TOSHIRO
分类号 H01G4/12;C23C18/28;H01G4/30;H05K3/24;(IPC1-7):C23C18/28 主分类号 H01G4/12
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