发明名称 |
Photosensitive compositions and pattern formation method |
摘要 |
PCT No. PCT/JP98/01926 Sec. 371 Date May 12, 1999 Sec. 102(e) Date May 12, 1999 PCT Filed Apr. 27, 1998 PCT Pub. No. WO98/49600 PCT Pub. Date Nov. 5, 1998Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylformamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
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申请公布号 |
US6140007(A) |
申请公布日期 |
2000.10.31 |
申请号 |
US19990214154 |
申请日期 |
1999.05.12 |
申请人 |
TOYO GOSEI KOGYO CO., LTD. |
发明人 |
WATANABE, MASAHARU;TOCHIZAWA, NORIAKI;IMAMURA, YUKARI;KIKUCHI, HIDEO |
分类号 |
G03F7/004;C08F2/50;C08L33/26;C08L39/06;C09D4/00;G02B5/20;G03F7/00;G03F7/008;G03F7/012;G03F7/033;G03F7/038;H01J9/227;(IPC1-7):G03F7/12;G03F7/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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