发明名称 Photosensitive compositions and pattern formation method
摘要 PCT No. PCT/JP98/01926 Sec. 371 Date May 12, 1999 Sec. 102(e) Date May 12, 1999 PCT Filed Apr. 27, 1998 PCT Pub. No. WO98/49600 PCT Pub. Date Nov. 5, 1998Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylformamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
申请公布号 US6140007(A) 申请公布日期 2000.10.31
申请号 US19990214154 申请日期 1999.05.12
申请人 TOYO GOSEI KOGYO CO., LTD. 发明人 WATANABE, MASAHARU;TOCHIZAWA, NORIAKI;IMAMURA, YUKARI;KIKUCHI, HIDEO
分类号 G03F7/004;C08F2/50;C08L33/26;C08L39/06;C09D4/00;G02B5/20;G03F7/00;G03F7/008;G03F7/012;G03F7/033;G03F7/038;H01J9/227;(IPC1-7):G03F7/12;G03F7/30 主分类号 G03F7/004
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