发明名称 Lichtmusterschablone und Laserablationsverfahren bzw. -gerät zu deren Herstellung
摘要 <p>A light pattern generator includes a reflective layer absorptive to infra-red radiation from which a desired pattern has been removed to allow passage of a light beam in the shape of the pattern. A method for making a light pattern generator includes forming a layer of reflective material on a transparent substrate and ablating a portion of the layer with a laser to create a desired pattern.</p>
申请公布号 DE69425943(D1) 申请公布日期 2000.10.26
申请号 DE1994625943 申请日期 1994.11.04
申请人 VARI-LITE, INC. 发明人 HUTTON, RICHARD W.
分类号 G02B5/22;B23K26/06;B23K26/18;B41M5/24;F21S8/00;F21V9/08;(IPC1-7):F21S10/02 主分类号 G02B5/22
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