发明名称 |
Lichtmusterschablone und Laserablationsverfahren bzw. -gerät zu deren Herstellung |
摘要 |
<p>A light pattern generator includes a reflective layer absorptive to infra-red radiation from which a desired pattern has been removed to allow passage of a light beam in the shape of the pattern. A method for making a light pattern generator includes forming a layer of reflective material on a transparent substrate and ablating a portion of the layer with a laser to create a desired pattern.</p> |
申请公布号 |
DE69425943(D1) |
申请公布日期 |
2000.10.26 |
申请号 |
DE1994625943 |
申请日期 |
1994.11.04 |
申请人 |
VARI-LITE, INC. |
发明人 |
HUTTON, RICHARD W. |
分类号 |
G02B5/22;B23K26/06;B23K26/18;B41M5/24;F21S8/00;F21V9/08;(IPC1-7):F21S10/02 |
主分类号 |
G02B5/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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