METHOD FOR FORMING CONTACT PAD HAVING LOW RESISTANCE

摘要

PURPOSE: A method for forming a contact pad having a low resistance is to lower a contact resistance of a pad, and simply a contact pad forming process. CONSTITUTION: A contact pad forming method comprises the steps of: forming a device isolating films(44) on a substrate(40); forming a gate deposition materials(46) between the device isolating films; forming an impurity region(56) on the substrate between the gate deposition materials; forming a spacers(58) on sides of the gate deposition materials; and forming a pad(60) having a height equal to that of the gate depositions materials at the impurity region between the spacers. The pad has a difficult crystal state of upper and lower materials. The step forming the pads further comprises forming a first pad on the impurity region between the spacers, and forming a second pad having a crystal state of material difficult from that of the first pad on the first pad. The first pad is formed of a material film having an amorphous state. The second pad is formed of a material film having a poly state. The first and the second pad are formed of a Si1-xGex film.