Plasma focus high energy photon source

摘要

The plasma pinch unit (2) comprises a coaxial electrode (8) powered by a low inductance pulse power circuit (10). A working gas mixture of helium and lithium vapor is discharged into a coaxial electrode. Electrical pulses from pulse power unit (10) create a dense plasma focus at sufficiently high temperature and pressures to doubly ionize the lithium atoms in the working gas generating ultraviolet radiation at about 13.5 nm wavelength. This light is collected in total external reflection-collector (4) and directed into a hollow light pipe (6) where the light is directed to a lithography tool.