发明名称 |
Ion implanter |
摘要 |
<p>Ion implanter for sequentially processing single semiconductor wafers comprises a scanning arm extending along a first axis. A wafer holder is mounted on a free end of the arm so as to be rotatable about a second axis centered on and perpendicular to the plane of the wafer. The wafer can be scanned through an ion beam by reciprocating the arm transversely of the first axis. A rotary motor is mounted in the scanning arm near the free end with its axis of rotation parallel to the first axis and perpendicular to the second axis. A right angle rotary drive connects the motor to the wafer holder. A hard stop is provided on the motor to prevent the wafer from being rotated by more than 360[deg]. Connections to the wafer on the holder are provided by a flexible circuit coiled about the second axis.</p> |
申请公布号 |
EP1047101(A2) |
申请公布日期 |
2000.10.25 |
申请号 |
EP20000303204 |
申请日期 |
2000.04.17 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SATOH, SHU;SMICK, THEODORE H. |
分类号 |
C23C14/48;H01J37/317;H01L21/265;(IPC1-7):H01J37/20 |
主分类号 |
C23C14/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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