发明名称 CHEMICAL AMPLIFIED RESIST COMPOSITION COMPRISED OF BLENDING POLYMER CONTAINING PHOTOSENSITIVE POLYMER CONTAINING ANTHRACENE DERIVATIVE
摘要 PURPOSE: A chemical amplified resist composition is provided, which is comprised of blending polymer containing at least of two photosensitive polymers containing anthracene derivative. CONSTITUTION: The photoresist composition comprises; (i) the photosensitive polymer having 2,000- 200,000 of weight average molecular weight represented by the formula I, wherein, R1 is hydrogen or methyl and x/(x+y)=0.1-0.5; (ii) the photosensitive polymer having 2,000-200,000 of weight average molecular weight represented by the formula II, wherein, R2 is hydrogen or methyl, R3 and R4 are independently the group of linear chain of C1-C3 or group containing one group selected from hydroxy group or carboxyl group, m/(m+n)=0.1-0.5; (iii) blending polymer comprised of polymer containing acetal group; and (iv) photoacid generator.
申请公布号 KR20000061889(A) 申请公布日期 2000.10.25
申请号 KR19990011270 申请日期 1999.03.31
申请人 SAMSUNG ELECTRONICS CO, LTD. 发明人 KANG, YUL
分类号 G03F7/004 主分类号 G03F7/004
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