摘要 |
PURPOSE: A chemical amplified resist composition is provided, which is comprised of blending polymer containing at least of two photosensitive polymers containing anthracene derivative. CONSTITUTION: The photoresist composition comprises; (i) the photosensitive polymer having 2,000- 200,000 of weight average molecular weight represented by the formula I, wherein, R1 is hydrogen or methyl and x/(x+y)=0.1-0.5; (ii) the photosensitive polymer having 2,000-200,000 of weight average molecular weight represented by the formula II, wherein, R2 is hydrogen or methyl, R3 and R4 are independently the group of linear chain of C1-C3 or group containing one group selected from hydroxy group or carboxyl group, m/(m+n)=0.1-0.5; (iii) blending polymer comprised of polymer containing acetal group; and (iv) photoacid generator. |