| 发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION |
| 摘要 |
<p>A radiation-sensitive resin composition contains an alkali-soluble resin using an aniline compound as one component of the monomers. A radiation-sensitive resin composition contains an alkali-soluble resin using a compound of formula (I); [Image] R : hydrogen atom or 1-4C alkyl group; n : an integer 0 or 1-3 as one component of the monomers.</p> |
| 申请公布号 |
EP1046956(A1) |
申请公布日期 |
2000.10.25 |
| 申请号 |
EP19990951186 |
申请日期 |
1999.11.01 |
| 申请人 |
CLARIANT INTERNATIONAL LTD. |
发明人 |
KOBAYASHI, SATOSHI;SHIODA, HIDEKAZU;ITOH, HARUHIKO |
| 分类号 |
H01L21/027;C08F2/46;G03F7/004;G03F7/023;G03F7/032;G03F7/038;(IPC1-7):G03F7/023;G03F7/039;C08L61/34;C08G14/073 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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