| 摘要 |
PROBLEM TO BE SOLVED: To obtain an aqueous developing solution used in the formation of a pattern by the development of an energy line sensitive resist film and excellent in developing ability, aging stability and ability to color the resist film in the case where a dye is added. SOLUTION: The top of a substrate is coated with an energy line sensitive resist composition to form a film, the surface of this energy line sensitive resist film is irradiated with active energy lines or heat rays directly or by way of a mask in such a way that the desired pattern is obtained and then the resist film is processed with an alkaline or acidic aqueous developing solution to form a resist film pattern on the substrate. The aqueous developing solution contains 0.01-3 wt.% aqueous organic solvent having a solubility parameter (SP value) of >=8.5.
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