发明名称 COMPOSITION FOR FORMING FILM, FORMATION METHOD OF FILM, AND LOWERED-DENSITY FILM
摘要 PROBLEM TO BE SOLVED: To obtain a composition for forming a film, from which a uniform coating film having superior dielectric constant characteristic, heat resistance, mechanical characteristic, etc., can be formed and a film which is formed by hardening the composition. SOLUTION: A composition for forming a film contains (A) the hydrolysate of a compound represented by R1nSi(OR2)4-n (where R1 and R2 represent identical or different elements, having univalent organic groups, and (n) represents integer of 0 to 2) and its partial condensate or either the hydrolysate or partial condensate, (B) an alkylene glycol-based solvent, (C) at least one kind of solvent selected from among an ester-based solvent and a ketone-based solvent, and (D) a compound which is made compatible with or is dispersed in the component (A) and has a boiling point or a decomposition temperature of 250-450 deg.C.
申请公布号 JP2000299316(A) 申请公布日期 2000.10.24
申请号 JP19990104169 申请日期 1999.04.12
申请人 JSR CORP 发明人 SUGIURA MAKOTO;KUROSAWA TAKAHIKO;GOTO KOHEI;YAMADA KINJI
分类号 H01L21/316;C09D183/04;(IPC1-7):H01L21/316 主分类号 H01L21/316
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