发明名称 POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a completely uniform pressure and to provide a substrate with flatness by constituting a carrier holding the substrate of a polysilicon gel sheet with a prescribed physical property attached to a disc fitting plate fixed to the bottom end of a cylindrical head journalled to a hollow shaft. SOLUTION: A carrier is pressed against a substrate W, a polysilicon gel sheet (flexible film) 5 is decompressed to be stuck to a washer 6 to hold the substrate W to the flexible film 5 by the negative pressure. The substrate W is pressed against a polishing cloth surface, pressurized gas is fed between the flexible film 5 and the bottom of the washer 6 to polish the surface of the substrate W. The polysilicon gel sheet has the hardness 30-200 in the penetration 1/10 mm of 50 g loading under JISK-2207, the extension 100-1000% under JISA-5758, the thickness 1-30 mm, and the compression set 1-8% in conformity to JISK-6301, that is the residual strain after compressed 75% and held for 22 hours under 70 deg.C, it is released from the compression and kept for 30 minutes at 23 deg.C in a thermostatic chamber.
申请公布号 JP2000296460(A) 申请公布日期 2000.10.24
申请号 JP19990104654 申请日期 1999.04.13
申请人 OKAMOTO MACHINE TOOL WORKS LTD 发明人 SAKO YAMATO;SEKI MASAYA;KUBO TOMIO
分类号 B24B37/30;C08J7/04;C08J9/32;C08K3/04;C08L101/00;C08L101/16;H01L21/304 主分类号 B24B37/30
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