| 摘要 |
PROBLEM TO BE SOLVED: To feed and discharge workpieces automatically, reliably and efficiently into and from double-face polishing device systems with a carrier making rotation-free circular motion. SOLUTION: This system is for a double-face polishing device 11 comprising an upper and a lower surface plate for polishing wafers 10 received in through- holes cut in a carrier by sandwiching them in between from the vertical opposite sides and moving relative to them, and a carrier revolving mechanism for providing rotation-free circular motion for the carrier to revolve the wafers 10. The system comprises carrier stopping means disposed in the carrier revolving mechanism to stop the carrier in a prescribed position, an arm robot 54 having at its tip a wafer holding mechanism 52 so that the wafers 10 are positively fed into and discharged from the carrier through-holes, and workpiece feeding/ discharging means 50 having an image processor for determining the shape and position of the carrier through-holes and wafers 10. |
