| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing device capable of easily increasing the relative velocity of the surface of a substrate to be washed and a washing brush and also capable of suppressing the washing brush from being damaged. SOLUTION: In the washing device provided with a mounting stand 13 for mounting a semiconductor wafer 11, a rotary shaft 15 arranged upward of the mounting stand 13, a driving means for rotating and driving the rotary shaft 15, an arm 23 connected to the one end of the rotary shaft 15 and arranged in vertical direction of the rotary shaft 15 and cams 21a and 21b connected to the arm 23, a cam for moving the arm 23 up and down at the time of rotating the arm 23 round the rotary shaft 15 and the washing brush 19 mounted on the arm 23 and arranged by providing a prescribed distance from one end of the rotary shaft 15 are installed.
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