| 发明名称 |
Polishing composition including an inhibitor of tungsten etching |
| 摘要 |
A chemical mechanical polishing composition comprising a composition capable of etching tungsten and at least one inhibitor of tungsten etching and methods for using the composition to polish tungsten containing substrates.
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| 申请公布号 |
US6136711(A) |
申请公布日期 |
2000.10.24 |
| 申请号 |
US19980086659 |
申请日期 |
1998.05.29 |
| 申请人 |
CABOT CORPORATION |
发明人 |
GRUMBINE, STEVEN K.;STREINZ, CHRISTOPHER C.;HOGLUND, ERIC W.G. |
| 分类号 |
B24B37/00;C09G1/02;C09K3/14;C09K13/04;C09K15/20;C23F3/00;H01L21/304;H01L21/306;H01L21/321;(IPC1-7):H01L21/00 |
主分类号 |
B24B37/00 |
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