| 摘要 |
PROBLEM TO BE SOLVED: To improve productivity by forming a layer of a barrier rib material in gaps of a resin pattern formed with a photosensitive resin on a substrate and on the resin pattern, mounting the substrate on a surface plate for vacuum chuck, and wet-polishing the portion of the barrier rib material exceeding the height of the resin pattern with a belt sander. SOLUTION: A photosensitive resin layer 2 is formed on a substrate 1, and a resin pattern 4 with the thickness of 10-300μm is formed by photolithography using a negative mask 3. A barrier rib material 5 is applied in gaps of the resin pattern 4 and on the resin pattern 4, and an organic solvent is removed by drying to cure the substrate 1. The substrate 1 is mounted and fixed on a surface plate having a vacuum chuck function. The substrate 1 is wet-polished by a resin belt stuck with an abrasive of #200 or above such as silica or alumina while a cleaning solvent is fed, and the portion of the barrier rib material 5 exceeding the height of the resin pattern 4 is removed. The resin pattern 4 is removed, and a barrier rib 6 is obtained by baking.
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