INTERFACE CHAMBER FOR POD IN CLEAN ROOM

摘要

PROBLEM TO BE SOLVED: To protect a wafer against contamination by providing a unit for circulating the air in an interface chamber and keeping the pressure in the interface chamber higher than that of a surrounding clean room thereby setting the allowable contamination around the clean room at a low level. SOLUTION: An interface chamber 1 is filled with pressurized clean air of class 1-10 and set with a pressure level higher than the air pressure of a surrounding clean room. More specifically, an air outlet 4a as one end of a connection pipe 4 connected with an inner circulation fan 3 for pressurization, and an air inlet 4b as the other end thereof are provided in the interface chamber 1 while penetrating a double wall 1a. A chemical filter 5 and a ULPA(ultra low penetration air) filter 9 are interposed between the inner circulation fan 3 for pressurization and the air outlet 4b and a dry clean air unit 7 is also coupled.