POLISHING METHOD AND SYSTEM

摘要

PROBLEM TO BE SOLVED: To hold the performance of a polishing tool at a high level and to polish a workpiece highly precisely by dressing the polishing tool by a dress tool under such dressing conditions as prescribed according to the load ratio of the polishing tool and a polishing quantity distribution of the workpiece. SOLUTION: The arithmetic part 52 of a controller 50 finds the load ratio of a polishing pad 11 from a profile of the polishing pad 11 detected by a surface roughness detector 30 and at the same time finds polishing quantity distribution and mean polishing quantity from polishing quantities of a plurality of points of a wafer 1 detected by a polishing quantity detector 40. A dressing condition-setting part 53 sets dressing conditions based on the value determined by the arithmetic part 52, and the control part 51 transmits a drive control signal to an electropneumatic regulator 28 of a dressing device 20 so that the dressing load in dressing becomes the determined load. The air quantity according to the drive control signal is fed to an air cylinder 24 to push a dressing grindstone chuck 22 and a dressing grindstone 21 against the polishing pad 11.