| 摘要 |
PROBLEM TO BE SOLVED: To realize a processing apparatus and a method, where a target processing can be carried out at a low cost when a processing liquid is fed through a spin-less method to carry out prescribed processing. SOLUTION: This processing method is carried out in a manner, where a glass substrate G as a work is supported, with support pins 46 provided on a base 45 in a chamber 40 separated from the base 45 by a certain distance, and a processing liquid is fed to the chamber 40 through an inlet port 42 provided to a side 41 of the chamber 40. The processing liquid fed to the chamber 40 flows toward an outlet port 44 provided to the side 43 opposed to the side 41 where the inlet port 42 is provided and then flows out of the chamber 40 through the outlet port 44. While the liquid is staying in the chamber 40, it is brought into contact with both the front and rear of the glass substrate G, whose position is fixed by a position fixing means. By this setup, even though the processing position of the substrate G is fixed, the glass substrate can be subjected to a prescribed treatment such as a cleaning treatment or a developing treatment without using an exclusive treatment tools such as a brush or the like. |
