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发明名称
Method and apparatus for correcting defects in photomask
摘要
申请公布号
US6136096(A)
申请公布日期
2000.10.24
申请号
US19970848743
申请日期
1997.05.01
申请人
NEC CORPORATION
发明人
MORISHIGE, YUKIO
分类号
G03F1/08;C23C16/04;C23C16/16;C23C16/34;G03F1/00;G03F1/72;H01L21/027;(IPC1-7):C23C16/00
主分类号
G03F1/08
代理机构
代理人
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