FORMATION OF PHOTOCATALYST FILM

摘要

PROBLEM TO BE SOLVED: To form a photocatalyst film having high activity and high film strength at low temperature. SOLUTION: A substrate 8 consisting of plastic, etc., is fixed to a substrate holder 7 and a raw material 5 for vapor deposition consisting of metallic material is put into a crucible. The substrate 8 is irradiated with mixed excitation rays of oxygen ions, oxygen radical and oxygen plasma from an excitation ray source 6. The raw material 5 for vapor deposition 5 is heated by casting electron beams 4 thereto simultaneously therewith, by which the raw material is evaporated and is adhered onto the substrate 8 to form a metal oxide and the photocatalyst film is thus formed.