| 摘要 |
PROBLEM TO BE SOLVED: To obtain an electron beam drawing apparatus, where an electron beam is capable of reaching to a shutoff stop edge passing through a distance much smaller than a total deflection amplitude at shutoff and deflection of a beam, a time required for shutting off a beam is markedly shortened, and a drawing pattern is improved in resolution. SOLUTION: Blanking deflectors 22 and 23, which shut off or introduce an electron beam that impinges on a drawing material 6, constitute a two-staged deflection system, by which an electron beam is deflected in the same direction. An intermediate plate located between two-staged deflectors is made to serve as a virtual deflection main surface, and a beam shutoff/stop 24 is arranged on this main plane. An opening provided to the stop 24 can be regulated in position by an adjusting mechanism 25. The position of a stop opening is regulated by the adjusting mechanism 25, and an electron beam path opening provided to the stop 24 is positioned adjacent to the position of a beam axis, at which an electron beam is never blocked, and an electron beam is blanked in this state.
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