| 摘要 |
PROBLEM TO BE SOLVED: To create a chip layout of a chip array having a desired pattern at pattern formation with sure even in a semiconductor substrate in which there is given a bad mark, a flaw, etc. SOLUTION: A pattern matching result of a non-defective chip is obtained with a picture image of a non-defective chip pattern as a reference, and a pattern matching result of a TEG (a chip to be inspected) is obtained with the picture image of the non-defective chip pattern as a reference. Based on these results, a threshold that discriminates the non-defective chip and a defective chip in which there is given a bad mark from the TEG is set, and pattern matching is performed for each chip of a wafer 11. Based on the result and the threshold, it is decided that each chip is a chip having a desired pattern only when it is a non-defective chip or a defective chip, and a chip layout is created using the result of decision. |
