| 摘要 |
PROBLEM TO BE SOLVED: To make the outline of a projected pattern clearer. SOLUTION: A projection aligner is provided with a lighting optical system 2 which projects exposing light upon an original plate (mask 3) carrying a prescribed pattern, and a projection optical system 4 which projects the pattern of the original plate 3 upon a substrate (wafer 5) which receives the exposing light through the plate 3 and contains a photosensitive material. The projection aligner is constituted in such a way that a protective means (disk 6) which interrupts the matters scattered from the photosensitive material or the gas discharged from the photosensitive material can be arranged between the projection optical system 4 and the substrate 5.
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