发明名称 LASER PLOTTING SYSTEM AND LASER PLOTTING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To make it possible to draw fine patterns at a high speed with a unifom definition by regulating the frequency of a clock signal to a specific value. SOLUTION: When the central angle 207 of a sectorial region inclusive of a region 202 is defined asθ(rad), the radius in the position of a laser spot for scanning as (r) and N as a positive value, the conditions under which dots line up in a diametral direction on at least segments 206 and 208 eventually suffice with that the length of the arc in the sectorial region of the central angleθin any radial position has a difference by integer times the one dot length from that adjacent in the radial direction of a master disk andθWD =NLd is resulted. The clock frequency fd of the control signal of an optical modulator is eventually fd=2πrNfc/θWd. The conditions for obtaining good resolution uniformly in the region to be scanned and irradiated with the laser spot are regulated to fd=rNfc/Wd withθas 2πin order to satisfy the requirement that the length on one circumference of the circle to be scanned be divided by the length Ld of the dot in any radial position.</p>
申请公布号 JP2000292934(A) 申请公布日期 2000.10.20
申请号 JP19990101779 申请日期 1999.04.08
申请人 SEIKO EPSON CORP 发明人 NAGASAKA KIMIO;MIYAMAE AKIRA
分类号 H01L21/027;B41J2/44;B41J19/16;G03F1/00;G03F1/68;G03F1/76;G03F7/20;(IPC1-7):G03F7/20;G03F1/08 主分类号 H01L21/027
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