发明名称 PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD BY USING SAME
摘要 PROBLEM TO BE SOLVED: To provide a positive pattern forming method superior in various characteristics, such as sensitivity and resolution and roughness of pattern edges, at the time of forming the pattern by development using an aqueous alkaline solution. SOLUTION: This pattern forming material contains (a) a resin obtained by additionally reacting a binder resin having a carboxylic group and/or a phenolic hydroxyl group with a compound having at least 2 vinyl ether groups in a molecule in the presence of an acid catalyst, and (b) at least a compound to be induced to produce an acid by irradiation with radiation. The above binder resin has a weight average molecular weight(Mw) to a number average molecular weight (Mn) ratio (Mw/Mn) in the range of 1.0-2.0.
申请公布号 JP2000292927(A) 申请公布日期 2000.10.20
申请号 JP19990103712 申请日期 1999.04.12
申请人 HITACHI LTD;HITACHI CHEM CO LTD 发明人 SAKAMIZU TOSHIO;ARAI TADASHI
分类号 H01L21/027;C08F8/00;C08F212/14;C08G8/36;C08K5/00;C08L25/18;C08L61/14;G03F7/039;G03F7/38 主分类号 H01L21/027
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