| 摘要 |
PROBLEM TO BE SOLVED: To provide an analyzing sample for metal impurity capable of precisely measuring the metal impurity content in a synthetic resin by adhering an acid droplet to a synthetic resin analyzing sample to extract a metal element, and evaporating and condensing the recovered droplet to perform quantitative determination. SOLUTION: An analyzing sample vessel 2 containing an analyzing sample S2 is arranged with a space so as not to make direct contact with a sample decomposing solution 3. Therefore, only the gas phase of the sample decomposing solution 3 evaporated by heating can touch the analyzing sample S2 to decompose the analyzing sample S2. Accordingly, by the synergistic effect of the sampling free from metal contamination of shaving by use of a silicon wafer having a small metal contamination degree and the analyzing sample treatment method of extracting an intended matter without metal contamination of the analyzing sample S2 by the gas phase of the evaporated sample decomposing solution 3, the analyzing sample S2 free from metal contamination can be manufactured. Further, a plurality of analyzing samples S2 manufactured by shaving the same part of a synthetic resin-made analyzing sample group (for example, physical and chemical apparatus) by use of a cut silicon wafer in the depth direction a plurality of times is analyzed, whereby a sample capable of precisely measuring the depth directional contamination degree of the analyzing sample group can be provided.
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