| 摘要 |
PROBLEM TO BE SOLVED: To remove the influence of flexure depending upon the mount position of a substrate by a pattern position measuring instrument. SOLUTION: [ΔLx,ΔLy] is calculated by a finite element method every position (X, Y,ψ) where the substrate 10 is mounted and stored in a storage device 22. The mount position of the substrate 10 is detected by a subordinate objective 16 and a pattern position on the substrate 10 is detected by a main objective 11. A main controller 20 reads a two-dimensional error quantity [ΔLx,ΔLy] calculated from the position (X, Y,ψ) where the substrate 10 is mounted is read out of the storage device 22 and the pattern position is corrected with the two-dimensional error quantity (ΔLx,ΔLy) based upon the pattern position on the substrate 10.
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