| 发明名称 |
LARGE PHOTOSENSITIVITY IN LEAD SILICATE GLASSES |
| 摘要 |
The present invention provides a method for inducing a refractive index chan ge in a lead silicate glass material comprising: providing a lead silicate glas s material; and irradiating the lead silicate glass material to increase the index of refraction of said lead silicate glass material. The present invention also provides a photo-induced lead silicate glass grating.
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| 申请公布号 |
CA2369584(A1) |
申请公布日期 |
2000.10.19 |
| 申请号 |
CA20002369584 |
申请日期 |
2000.04.07 |
| 申请人 |
THE UNIVERSITY OF NEW MEXICO |
发明人 |
BRUECK, STEVEN R. J.;LONG, XIANGCUN |
| 分类号 |
C03C3/07;C03C3/074;C03C3/102;C03C23/00;C03C25/62;G02B6/124;(IPC1-7):C03B37/10;G02B6/34 |
主分类号 |
C03C3/07 |
| 代理机构 |
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