发明名称 |
Mask structure and method of manufacturing the same |
摘要 |
A mask manufacturing method includes performing a multiple exposure process to a substrate so that a number of latent images are formed on the substrate, and processing the exposed substrate to produce actual mask patterns, wherein the multiple exposure process includes a first exposure step for forming a latent image of relatively-fine periodic patterns on the substrate by use of a first master mask having absorptive periodic patterns, and a second exposure step for forming a latent image of relatively-rough patterns on the substrate by use of a second master mask having absorptive patterns. <IMAGE> |
申请公布号 |
EP1045288(A2) |
申请公布日期 |
2000.10.18 |
申请号 |
EP20000302991 |
申请日期 |
2000.04.10 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
AMEMIYA, MITSUAKI;UZAWA, SHUNICHI;CHIBA, KEIKO |
分类号 |
H01L21/027;G03F1/22;G03F1/24;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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