Method and apparatus for producing extreme ultra-violet light for use in photolithography

摘要

A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and a diffuser for capturing a substantial portion of the gas so as to mitigate contamination caused thereby. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like.