| 摘要 |
A processing system includes a coating/developing station for performing either a solution processing for processing a substrate using solution or a thermal processing for thermally processing the substrate, and a transfer unit for transferring the substrate into and from the coating/developing station. A casing encases the coating/developing station and the transfer unit. An interface section, provided in the casing, transfers the substrate into and from an external exposure machine for exposing the resist on the substrate. A pressure setting device sets a pressure in the casing to be lower than a pressure in the external exposure machine.
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