发明名称 GAS TREATING DEVICE, BUFFLE MEMBER, AND GAS TREATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a gas treating device capable of uniformly feeding gas to the whole face of the surface of a body to be treated, to provide a gas treating method, and to provide a buffle board used for the device and method. SOLUTION: This gas treating device is provided with an air-tightly composed treating chamber, a gas introducing tube 3 connected to the treating chamber, a gas feeding source feeding gas to the inside of the treating chamber via the gas introducing tube 3, a placing stand arranged in the treating chamber 2 and placed with a wafer, a shower head 8 provided at the gas outlet 3a of the gas introducing tube 3, and in which the injecting side is faced to the side of the placing stand, discharging boards 9 in which many discharging holes 10 composing bulkheads on the side of the placing stand in the shower head 10 are pierced and buffle boards 11 arranged on the space between the discharging boards 9 and the gas outlet 3a of the gas introducing tube 3, and in which many through holes 12 are pierced. The through hole 12 is composed of the one with different sizes consisting of an upper hole part 13 formed on the side of the gas introducing tube 3 and a lower hole part 14 expansively opened from the upper hole part 13 toward the side of the discharging board 9.
申请公布号 JP2000290777(A) 申请公布日期 2000.10.17
申请号 JP19990100341 申请日期 1999.04.07
申请人 TOKYO ELECTRON LTD 发明人 KOMIYA TARO;YONENAGA TOMIHIRO;IWATA TERUO;KASAI SHIGERU
分类号 H01L21/302;C23C14/24;C23C16/44;C23C16/455;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):C23C16/44;H01L21/306 主分类号 H01L21/302
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